Invention Grant
- Patent Title: Vertical complementary FET
- Patent Title (中): 垂直互补FET
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Application No.: US13413175Application Date: 2012-03-06
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Publication No.: US08476710B2Publication Date: 2013-07-02
- Inventor: Qin Huang
- Applicant: Qin Huang
- Applicant Address: CN Wuxi, Jiangsu Province
- Assignee: Wuxi Versine Semiconductor Corp., Ltd.
- Current Assignee: Wuxi Versine Semiconductor Corp., Ltd.
- Current Assignee Address: CN Wuxi, Jiangsu Province
- Agency: Jacobson Holman PLLC
- Agent Jiwen Chen
- Priority: CN201110056548 20110309
- Main IPC: H01L23/62
- IPC: H01L23/62

Abstract:
A vertical complementary field effect transistor (FET) relates to the production technology of semiconductor chips and more particularly to the production technology of power integration circuit. A part of the substrate bottom of the invention extends into the middle layer and form the plug between the two MOS units. There is an output terminal under the substrate layer. When on-state voltage is applied on the gate electrode of the two MOS units, two conduction paths are formed from MOS unit-plug-substrate to the output terminal. This technology can integrate more than two MOS devices. Therefore, the die size is reduced.
Public/Granted literature
- US20120228698A1 VERTICAL COMPLEMENTARY FET Public/Granted day:2012-09-13
Information query
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