Invention Grant
US08476730B2 Geiger-mode photodiode with integrated and JFET-effect-adjustable quenching resistor, photodiode array, and corresponding manufacturing method
有权
Geiger型光电二极管集成JFET效应可调式淬火电阻,光电二极管阵列及相应的制造方法
- Patent Title: Geiger-mode photodiode with integrated and JFET-effect-adjustable quenching resistor, photodiode array, and corresponding manufacturing method
- Patent Title (中): Geiger型光电二极管集成JFET效应可调式淬火电阻,光电二极管阵列及相应的制造方法
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Application No.: US12764888Application Date: 2010-04-21
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Publication No.: US08476730B2Publication Date: 2013-07-02
- Inventor: Delfo Nunziato Sanfilippo , Massimo Cataldo Mazzillo , Piero Giorgio Fallica
- Applicant: Delfo Nunziato Sanfilippo , Massimo Cataldo Mazzillo , Piero Giorgio Fallica
- Applicant Address: IT Agrate Brianza
- Assignee: STMicroelectronics S.r.l.
- Current Assignee: STMicroelectronics S.r.l.
- Current Assignee Address: IT Agrate Brianza
- Agency: Graybeal Jackson LLP
- Priority: ITTO2009A0322 20090423
- Main IPC: H01L31/06
- IPC: H01L31/06

Abstract:
An embodiment of a Geiger-mode avalanche photodiode, having: a body made of semiconductor material of a first type of conductivity, provided with a first surface and a second surface and forming a cathode region; and an anode region of a second type of conductivity, extending inside the body on top of the cathode region and facing the first surface. The photodiode moreover has: a buried region of the second type of conductivity, extending inside the body and surrounding an internal region of the body, which extends underneath the anode region and includes the internal region and defines a vertical quenching resistor; a sinker region extending through the body starting from the first surface and in direct contact with the buried region; and a contact region made of conductive material, overlying the first surface and in direct contact with the sinker region.
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