Invention Grant
US08477297B2 Refractive index distribution measuring method and apparatus, and method of producing optical element thereof, that use multiple transmission wavefronts of a test object immersed in at least one medium having a different refractive index from that of the test object and multiple reference transmission wavefronts of a reference object having known shape and refractive index distribution 有权
折射率分布测量方法和装置及其光学元件的制造方法,其使用浸没在具有与测试对象不同的折射率的折射率的至少一种介质中的测试对象的多个传输波前和参考的多个参考传输波阵面 具有已知形状和折射率分布的物体

  • Patent Title: Refractive index distribution measuring method and apparatus, and method of producing optical element thereof, that use multiple transmission wavefronts of a test object immersed in at least one medium having a different refractive index from that of the test object and multiple reference transmission wavefronts of a reference object having known shape and refractive index distribution
  • Patent Title (中): 折射率分布测量方法和装置及其光学元件的制造方法,其使用浸没在具有与测试对象不同的折射率的折射率的至少一种介质中的测试对象的多个传输波前和参考的多个参考传输波阵面 具有已知形状和折射率分布的物体
  • Application No.: US13305827
    Application Date: 2011-11-29
  • Publication No.: US08477297B2
    Publication Date: 2013-07-02
  • Inventor: Seima Kato
  • Applicant: Seima Kato
  • Applicant Address: JP
  • Assignee: Canon Kabushiki Kaisha
  • Current Assignee: Canon Kabushiki Kaisha
  • Current Assignee Address: JP
  • Agency: Rossi, Kimms & McDowell LLP
  • Priority: JP2010-270214 20101203
  • Main IPC: G01N21/41
  • IPC: G01N21/41
Refractive index distribution measuring method and apparatus, and method of producing optical element thereof, that use multiple transmission wavefronts of a test object immersed in at least one medium having a different refractive index from that of the test object and multiple reference transmission wavefronts of a reference object having known shape and refractive index distribution
Abstract:
The method measures first transmitted wavefronts and second transmitted wavefronts by respectively causing reference light to enter an object placed in plural placement states in a first medium and a second medium, calculates an aberration sensitivity with respect to changes of the placement state of the object, and calculates an alignment error of the object in each placement state by using the aberration sensitivity and the first and second transmitted wavefronts measured in each placement state. The method further calculates first and second reference transmitted wavefronts respectively acquirable when causing the reference light to enter the reference object placed in placement states including the alignment errors in the first medium and the second medium, and calculates a refractive index distribution of the object which a shape component thereof is removed, by using the first and second transmitted wavefronts and the first and second reference transmitted wavefronts.
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