Invention Grant
- Patent Title: Pattern-searching condition determining method, and pattern-searching condition setting device
- Patent Title (中): 模式搜索条件确定方法和模式搜索条件设置装置
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Application No.: US13122731Application Date: 2009-10-02
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Publication No.: US08478078B2Publication Date: 2013-07-02
- Inventor: Kei Sakai , Fumihiro Sasajima
- Applicant: Kei Sakai , Fumihiro Sasajima
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2008-259178 20081006
- International Application: PCT/JP2009/067227 WO 20091002
- International Announcement: WO2010/041596 WO 20100415
- Main IPC: G06K9/32
- IPC: G06K9/32

Abstract:
Provided is a method for determining the magnification of a pattern searching template of a scanning electron microscope. The determining method comprises: acquiring a first image initially at a first magnification; then acquiring a second image which contains a pattern image displayed on the first image at a second magnification lower than the first magnification; making the size of the first image coincident with the size of a third image which cut out a portion of the second image; thereafter determining the correlation value between the first image and the third image; and setting the second magnification as the magnification of a pattern searching template, in the case where the correlation value is equal to or higher than a predetermined value. As a result, a condition for acquiring a search area can be properly set, when pattern recognition is performed by means of the template.
Public/Granted literature
- US20110194778A1 PATTERN-SEARCHING CONDITION DETERMINING METHOD, AND PATTERN-SEARCHING CONDITION SETTING DEVICE Public/Granted day:2011-08-11
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