发明授权
- 专利标题： Active matrix substrate manufacturing method and liquid crystal display device manufacturing method
- 专利标题（中）： 有源矩阵基板制造方法和液晶显示装置的制造方法
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申请号： US13139732申请日： 2009-12-16
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公开(公告)号： US08481351B2公开(公告)日： 2013-07-09
- 发明人: Kiyohiro Kawasaki
- 申请人： Kiyohiro Kawasaki
- 申请人地址： JP Osaka
- 专利权人： Sharp Kabushiki Kaisha
- 当前专利权人： Sharp Kabushiki Kaisha
- 当前专利权人地址： JP Osaka
- 代理机构： Keating & Bennett, LLP
- 优先权： JP2008-324392 20081219
- 国际申请： PCT/JP2009/070999 WO 20091216
- 国际公布： WO2010/071160 WO 20100624
- 主分类号： H01L21/84
- IPC分类号： H01L21/84
摘要：
Provided is an active matrix substrate manufacturing method, including the steps of: selectively forming a laminated structure pattern, by forming the laminated structure on a glass substrate (2), by forming a first photosensitive resin pattern (PR) on the laminated structure, and by selectively forming the laminated structure pattern using the first photosensitive resin pattern (PR), the laminated structure including a metal layer (a scanning signal line (11) material), a gate insulative layer (30), and a semiconductor layer (31, 33) (transistor material); fluorinating a surface of the first photosensitive resin pattern (PR) by dry-etching with fluorine gas; applying a coating-type transparent insulative resin (60) onto the glass substrate (2) to fill a space in the laminated structure pattern; and removing the fluorinated first photosensitive resin pattern (PR). This enables to form, in an active matrix substrate manufacturing process, a scanning signal line and a semiconductor layer with a single mask process.