Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US13083327Application Date: 2011-04-08
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Publication No.: US08481978B2Publication Date: 2013-07-09
- Inventor: Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
- Applicant: Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G21G5/00
- IPC: G21G5/00
Abstract:
In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
Public/Granted literature
- US20110183257A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2011-07-28
Information query
IPC分类:
| G | 物理 |
| G21 | 核物理；核工程 |
| G21G | 化学元素的转变；放射源 |
| G21G5/00 | 通过化学反应进行化学元素的推断转变 |
