Invention Grant
US08484584B2 Systems, methods and computer program products for forming photomasks with reduced likelihood of feature collapse, and photomasks so formed
有权
用于形成具有降低特征崩溃可能性的光掩模的系统，方法和计算机程序产品以及如此形成的光掩模
- Patent Title: Systems, methods and computer program products for forming photomasks with reduced likelihood of feature collapse, and photomasks so formed
- Patent Title (中): 用于形成具有降低特征崩溃可能性的光掩模的系统，方法和计算机程序产品以及如此形成的光掩模
-
Application No.: US13281787Application Date: 2011-10-26
-
Publication No.: US08484584B2Publication Date: 2013-07-09
- Inventor: Mi-kyeong Lee , Seong-woon Choi
- Applicant: Mi-kyeong Lee , Seong-woon Choi
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2011-0011926 20110210
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/00 ; G03C5/00
Abstract:
At least one pattern of a photomask is identified that has a likelihood of causing collapse of a microelectronic device feature that is formed using the photomask, due to surface tension of a solution that is applied to the feature during manufacture of the microelectronic device. The patterns of the photomask are then modified to reduce the likelihood of the collapse. The photomask may be formed and the photomask may be used to manufacture microelectronic devices. Related methods, systems, devices and computer program products are described.
Public/Granted literature
Information query
