Invention Grant
- Patent Title: Roll-to-roll digital photolithography
- Patent Title (中): 卷对卷数字光刻
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Application No.: US13141108Application Date: 2009-12-17
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Publication No.: US08486593B2Publication Date: 2013-07-16
- Inventor: Michael A. Haase , Jeffrey H. Tokie , Daniel J. Theis , Brian K. Nelson
- Applicant: Michael A. Haase , Jeffrey H. Tokie , Daniel J. Theis , Brian K. Nelson
- Applicant Address: US MN St. Paul
- Assignee: 3M Innovative Properties Company
- Current Assignee: 3M Innovative Properties Company
- Current Assignee Address: US MN St. Paul
- Agent Stephen L. Crooks; Kristofer L. Storvick
- International Application: PCT/US2009/068426 WO 20091217
- International Announcement: WO2010/075158 WO 20100701
- Main IPC: G03F9/00
- IPC: G03F9/00

Abstract:
Methods of making flexible circuit films include providing a polymer film or other flexible substrate having a plurality of alignment marks and a photosensitive material thereon. The substrate passes around a suitable roller, belt, or other inelastic conveyor such that the substrate and the conveyor move together at least from a first location to a second location. Positions of a first set of the alignment marks on a first portion of the substrate are measured when such portion is at the first location, and the measured positions can be used to calculate a distortion of the substrate. The photosensitive material is then patternwise exposed when the first portion of the substrate has moved to the second location. The patternwise exposing is based on the measured positions of the first set of alignment marks, and may include exposing the web with a distortion-adjusted pattern. Related systems and articles are also disclosed.
Public/Granted literature
- US20110253425A1 ROLL-TO-ROLL DIGITAL PHOTOLITHOGRAPHY Public/Granted day:2011-10-20
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