Invention Grant
US08486753B2 Patterning method of metal oxide thin film using nanoimprinting, and manufacturing method of light emitting diode
有权
使用纳米压印的金属氧化物薄膜的图案化方法和发光二极管的制造方法
- Patent Title: Patterning method of metal oxide thin film using nanoimprinting, and manufacturing method of light emitting diode
- Patent Title (中): 使用纳米压印的金属氧化物薄膜的图案化方法和发光二极管的制造方法
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Application No.: US12698194Application Date: 2010-02-02
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Publication No.: US08486753B2Publication Date: 2013-07-16
- Inventor: Hyeong Ho Park , Jun Ho Jeong , Ki Don Kim , Dae Geun Choi , Jun Hyuk Choi , Ji Hye Lee , Soon Won Lee
- Applicant: Hyeong Ho Park , Jun Ho Jeong , Ki Don Kim , Dae Geun Choi , Jun Hyuk Choi , Ji Hye Lee , Soon Won Lee
- Applicant Address: KR Daejeon
- Assignee: Korea Institute of Machinery and Materials
- Current Assignee: Korea Institute of Machinery and Materials
- Current Assignee Address: KR Daejeon
- Agency: Dority & Manning, P.A.
- Priority: KR10-2010-0003109 20100113
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Disclosed are a patterning method of a metal oxide thin film using nanoimprinting, and a manufacturing method of a light emitting diode (LED). The method for forming a metal oxide thin film pattern using nanoimprinting includes: coating a photosensitive metal-organic material precursor solution on a substrate; preparing a mold patterned to have a protrusion and depression structure; pressurizing the photosensitive metal-organic material precursor coating layer with the patterned mold; forming a cured metal oxide thin film pattern by heating the pressurized photosensitive metal-organic material precursor coating layer or by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer while being heated; and removing the patterned mold from the metal oxide thin film pattern, and selectively further includes annealing the metal oxide thin film pattern. Within this, there is provided a method for forming a metal dioxe thin film pattern using nano imprinting, which makes it possible to simplify the process for forming the pattern since the process of separately applying the ultraviolet resin to be used as the resist can be omitted, and forms a micro/nano composite pattern through a single imprint process.
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