Invention Grant
- Patent Title: MOSFET layout and structure with common source
- Patent Title (中): MOSFET布局和结构具有共同的来源
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Application No.: US13092992Application Date: 2011-04-25
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Publication No.: US08487377B2Publication Date: 2013-07-16
- Inventor: Chung-Che Yu , Kuo-Wei Peng , Li-Min Lee
- Applicant: Chung-Che Yu , Kuo-Wei Peng , Li-Min Lee
- Applicant Address: TW New Taipei
- Assignee: Green Solution Technology Co., Ltd.
- Current Assignee: Green Solution Technology Co., Ltd.
- Current Assignee Address: TW New Taipei
- Agency: CKC & Partners Co., Ltd.
- Priority: CN201010281515 20100913
- Main IPC: H01L27/02
- IPC: H01L27/02

Abstract:
A MOSFET layout is disclosed. The MOSFET comprises a drain region, a gate region, a source region and a body region. The gate region is disposed outside the drain region and adjacent to the drain region. The source region has a plurality of source sections, which are disposed outside of the gate region and adjacent to the gate region. Each of two adjacent source sections has a source blank zone there between. The body region has at least two body portions, which are disposed at the source blank zones and adjacent to the gate region.
Public/Granted literature
- US20120061771A1 MOSFET LAYOUT AND STRUCTURE Public/Granted day:2012-03-15
Information query
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