Invention Grant
- Patent Title: Nonvolatile semiconductor memory device
- Patent Title (中): 非易失性半导体存储器件
-
Application No.: US13301948Application Date: 2011-11-22
-
Publication No.: US08488378B2Publication Date: 2013-07-16
- Inventor: Takashi Maeda
- Applicant: Takashi Maeda
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-068889 20110325
- Main IPC: G11C11/34
- IPC: G11C11/34

Abstract:
A nonvolatile semiconductor memory device according to one aspect includes a semiconductor substrate, a memory string, a plurality of first conductive layers, a second conductive layer, and a third conductive layer. The memory string has a plurality of memory cells, a dummy transistor and a back gate transistor connected in series in a direction perpendicular to the semiconductor substrate. The plurality of first conductive layers are electrically connected to gates of the memory cells. The second conductive layer is electrically connected to a gate of the dummy transistor. The third conductive layer is electrically connected to a gate of the back gate transistor. The second conductive layer is short-circuited with the third conductive layer.
Public/Granted literature
- US20120243314A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2012-09-27
Information query