Invention Grant
- Patent Title: Thermally assisted dielectric charge trapping flash
- Patent Title (中): 热辅助电介质电荷捕捉闪光
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Application No.: US13099298Application Date: 2011-05-02
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Publication No.: US08488387B2Publication Date: 2013-07-16
- Inventor: Hang-Ting Lue , Chih-Ping Chen , Chih-Chang Hsieh , Yi-Hsuan Hsiao
- Applicant: Hang-Ting Lue , Chih-Ping Chen , Chih-Chang Hsieh , Yi-Hsuan Hsiao
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
A memory device includes an array of dielectric charge trapping structures memory cells including word lines and bit lines. Control circuitry is coupled to the array arranged to control read, program and erase operations. A controller is arranged with supporting circuitry thermally annealing charge trapping structures in the memory cells in the array. Word line drivers and word line termination circuits can be used to induce current flow on the word lines to induce heat for the annealing. The thermal annealing can be applied interleaved with normal operations for recover from cycling damage. Also, the thermally annealing can be applied during mission functions like erase, to improve performance of the function.
Public/Granted literature
- US20120281481A1 THERMALLY ASSISTED DIELECTRIC CHARGE TRAPPING FLASH Public/Granted day:2012-11-08
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