Invention Grant
- Patent Title: Polyimide resin composition, polyimide precursor resin composition for the same, production method thereof, and polyimide film and production method thereof
- Patent Title (中): 聚酰亚胺树脂组合物,聚酰亚胺前体树脂组合物及其制备方法及其制备方法
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Application No.: US12310288Application Date: 2008-08-07
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Publication No.: US08492506B2Publication Date: 2013-07-23
- Inventor: Takeshi Yoshida , Akira Shigeta , Yoshiaki Echigo
- Applicant: Takeshi Yoshida , Akira Shigeta , Yoshiaki Echigo
- Applicant Address: JP Amagasaki-Shi, Hyogo
- Assignee: Unitika Ltd.
- Current Assignee: Unitika Ltd.
- Current Assignee Address: JP Amagasaki-Shi, Hyogo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2007-211577 20070814; WOPCT/JP2008/053859 20080304
- International Application: PCT/JP2008/064190 WO 20080807
- International Announcement: WO2009/022619 WO 20090219
- Main IPC: C08G73/10
- IPC: C08G73/10 ; C08G73/00 ; C08G6/00 ; B29D7/00

Abstract:
An object of the present invention, which was made to solve the problems above, is to provide a polyimide precursor resin composition superior in transparency allowing reduction of the residual volatile material rate during molding and giving a polyimide resin composition (e.g., polyimide film) superior in mechanical properties and transparency even when a cheaper polyamide-imide is used. The present invention relates to a polyimide precursor resin composition, comprising a polyamide-imide (A) containing a diamine monomer unit represented by the following formula (1) and a polyamic acid (B) containing at least one kind of monomer unit selected tetracarboxylic acid monomer units represented by the following formulae (2p) to (2r), wherein the haze of the film having a thickness of 40 μm obtained by imidation of the polyimide precursor resin composition is 4% or less: (wherein, R represents an alkylene group having 1 to 5 carbon atoms);
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