Invention Grant
US08492980B2 Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing system 有权
用于校准施加到等离子体处理系统中的多个RF线圈的RF功率的方法

Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing system
Abstract:
Methods for calibrating RF power applied to a plurality of RF coils are provided. In some embodiments, a method of calibrating RF power applied to a first and second RF coil of a process chamber having a power divider to control a first ratio equal to a first magnitude of RF power provided to the first RF coil divided by a second magnitude of RF power provided to the second RF coil, may include measuring a plurality of first ratios over a range of setpoint values of the power divider, comparing the plurality of measured first ratios to a plurality of reference first ratios, and adjusting an actual value of the power divider at a given setpoint value such that the first ratio of the power divider at the given setpoint matches the corresponding reference first ratio to within a first tolerance level.
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