Invention Grant
US08492980B2 Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing system
有权
用于校准施加到等离子体处理系统中的多个RF线圈的RF功率的方法
- Patent Title: Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing system
- Patent Title (中): 用于校准施加到等离子体处理系统中的多个RF线圈的RF功率的方法
-
Application No.: US13090916Application Date: 2011-04-20
-
Publication No.: US08492980B2Publication Date: 2013-07-23
- Inventor: Samer Banna , Valentin N. Todorow , Tse-Chiang Wang , Xing Lin
- Applicant: Samer Banna , Valentin N. Todorow , Tse-Chiang Wang , Xing Lin
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: H05B31/26
- IPC: H05B31/26

Abstract:
Methods for calibrating RF power applied to a plurality of RF coils are provided. In some embodiments, a method of calibrating RF power applied to a first and second RF coil of a process chamber having a power divider to control a first ratio equal to a first magnitude of RF power provided to the first RF coil divided by a second magnitude of RF power provided to the second RF coil, may include measuring a plurality of first ratios over a range of setpoint values of the power divider, comparing the plurality of measured first ratios to a plurality of reference first ratios, and adjusting an actual value of the power divider at a given setpoint value such that the first ratio of the power divider at the given setpoint matches the corresponding reference first ratio to within a first tolerance level.
Public/Granted literature
- US20120104950A1 METHODS FOR CALIBRATING RF POWER APPLIED TO A PLURALITY OF RF COILS IN A PLASMA PROCESSING SYSTEM Public/Granted day:2012-05-03
Information query