发明授权
- 专利标题: Substrate holder and substrate holding method
- 专利标题(中): 基板支架和基板保持方法
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申请号: US12654561申请日: 2009-12-23
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公开(公告)号: US08506363B2公开(公告)日: 2013-08-13
- 发明人: Tamami Takahashi , Hiroaki Kusa , Masaya Seki
- 申请人: Tamami Takahashi , Hiroaki Kusa , Masaya Seki
- 申请人地址: JP Tokyo
- 专利权人: Ebara Corporation
- 当前专利权人: Ebara Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 优先权: JP2008-330053 20081225
- 主分类号: B24B29/02
- IPC分类号: B24B29/02
摘要:
A substrate holder is a mechanism for holding a substrate, to be polished, by vacuum suction. The substrate holder includes a substrate-holding stage having a suction surface for the substrate, and a fluid passage selectively coupled to a vacuum source and a fluid supply source. The suction surface has a plurality of closed sections surrounded by convexities, and the fluid passage includes a plurality of communication passages which are in fluid communication with the plurality of closed segments respectively and independently.
公开/授权文献
- US20100267317A1 Substrate holder and substrate holding method 公开/授权日:2010-10-21