发明授权
- 专利标题： Radiation-sensitive resin composition, polymer, and compound
- 专利标题（中）： 辐射敏感性树脂组合物，聚合物和化合物
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申请号： US13272523申请日： 2011-10-13
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公开(公告)号： US08507575B2公开(公告)日： 2013-08-13
- 发明人: Nobuji Matsumura , Yukio Nishimura , Akimasa Soyano , Ryuichi Serizawa , Noboru Otsuka , Hiroshi Tomioka
- 申请人： Nobuji Matsumura , Yukio Nishimura , Akimasa Soyano , Ryuichi Serizawa , Noboru Otsuka , Hiroshi Tomioka
- 申请人地址： JP Tokyo
- 专利权人： JSR Corporation
- 当前专利权人： JSR Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Ditthavong Mori & Steiner, P.C.
- 优先权： JP2009-098982 20090415; JP2009-129665 20090528; JP2009-191426 20090820; JP2010-028339 20100212
- 主分类号： C08F20/22
- IPC分类号： C08F20/22 ; B29D11/00 ; H05B6/68 ; C08G61/04
摘要：
A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). X+ is an onium cation. X+ in the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof.