发明授权
- 专利标题： Radiation source and lithographic apparatus
- 专利标题（中）： 辐射源和光刻设备
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申请号： US12543578申请日： 2009-08-19
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公开(公告)号： US08507882B2公开(公告)日： 2013-08-13
- 发明人: Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors
- 申请人： Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; H01J19/12
摘要：
A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a droplet generator constructed and arranged to generate fuel droplets, a heater constructed and arranged to heat the fuel droplets following generation of the fuel droplets by the droplet generator, and reduce the mass of fuel present in the fuel droplets and/or reduce the density of the fuel droplets, and a radiation emitter constructed and arranged to direct radiation onto the fuel droplets that have been heated by the heater to generate the extreme ultraviolet radiation.
公开/授权文献
- US20100053581A1 RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 公开/授权日：2010-03-04
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