Invention Grant
- Patent Title: Optical element and method
- Patent Title (中): 光学元件及方法
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Application No.: US12966552Application Date: 2010-12-13
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Publication No.: US08508854B2Publication Date: 2013-08-13
- Inventor: Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
- Applicant: Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102006045075 20060921
- Main IPC: G02B9/00
- IPC: G02B9/00
Abstract:
The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
Public/Granted literature
- US20110080569A1 OPTICAL ELEMENT AND METHOD Public/Granted day:2011-04-07
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