发明授权
US08513060B2 Manufacturing method using multi-step adhesive curing for sealed semiconductor device 有权
用于密封半导体器件的多步粘合剂固化的制造方法

  • 专利标题: Manufacturing method using multi-step adhesive curing for sealed semiconductor device
  • 专利标题(中): 用于密封半导体器件的多步粘合剂固化的制造方法
  • 申请号: US13559397
    申请日: 2012-07-26
  • 公开(公告)号: US08513060B2
    公开(公告)日: 2013-08-20
  • 发明人: Hiroaki Narita
  • 申请人: Hiroaki Narita
  • 申请人地址: JP Kawasaki-shi, Kanagawa
  • 专利权人: Renesas Electronics Corporation
  • 当前专利权人: Renesas Electronics Corporation
  • 当前专利权人地址: JP Kawasaki-shi, Kanagawa
  • 代理机构: Womble Carlyle
  • 优先权: JP2011-172907 20110808
  • 主分类号: H01L21/78
  • IPC分类号: H01L21/78
Manufacturing method using multi-step adhesive curing for sealed semiconductor device
摘要:
A method for forming a sealing body without cracks in manufacture of a semiconductor device having an external terminal formed through the use of an electrolysis plating method. A front surface of a semiconductor wafer is placed over a front surface of a first support heated to a first temperature. An adhesive sheet is then bonded to a back surface of the semiconductor wafer, after which the semiconductor wafer is subjected to heat treatment at a second temperature higher than the first temperature. After the semiconductor wafer and the adhesive sheet are cut along cutting regions, a plurality of semiconductor chips each having an adhesive patch bonded thereto are obtained. A mother substrate is placed over a front surface of a second support heated to a third temperature and the semiconductor chips are fixed to an upper surface of the mother substrate via the adhesive patch.
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