发明授权
- 专利标题: Gas-sensitive semiconductor device
- 专利标题(中): 气敏半导体器件
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申请号: US12924284申请日: 2010-09-23
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公开(公告)号: US08513711B2公开(公告)日: 2013-08-20
- 发明人: Denis Kunz , Markus Widenmeyer , Alexander Martin
- 申请人: Denis Kunz , Markus Widenmeyer , Alexander Martin
- 申请人地址: DE Stuttgart
- 专利权人: Robert Bosch GmbH
- 当前专利权人: Robert Bosch GmbH
- 当前专利权人地址: DE Stuttgart
- 代理机构: Kenyon & Kenyon LLP
- 优先权: DE102009045475 20091008
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A gas-sensitive semiconductor device having a semiconductive channel (10) which is delimited by a first (12) and a second (14) channel electrode, and having a gate electrode (16) which is associated with the channel and which cooperates with the channel in such a way that a change in conductivity of the channel (10) occurs as a response to an action of a gas. The gate electrode (16) and/or a gate insulation layer (20) which insulates the gate electrode from the channel, and/or a gate stack layer (18) which may be provided between the gate electrode and the channel have/has two surface sections (22, 24) which differ in their sensitivity to gases.
公开/授权文献
- US20110121368A1 Gas-sensitive semiconductor device 公开/授权日:2011-05-26
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