Invention Grant
- Patent Title: Gas-sensitive semiconductor device
- Patent Title (中): 气敏半导体器件
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Application No.: US12924284Application Date: 2010-09-23
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Publication No.: US08513711B2Publication Date: 2013-08-20
- Inventor: Denis Kunz , Markus Widenmeyer , Alexander Martin
- Applicant: Denis Kunz , Markus Widenmeyer , Alexander Martin
- Applicant Address: DE Stuttgart
- Assignee: Robert Bosch GmbH
- Current Assignee: Robert Bosch GmbH
- Current Assignee Address: DE Stuttgart
- Agency: Kenyon & Kenyon LLP
- Priority: DE102009045475 20091008
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A gas-sensitive semiconductor device having a semiconductive channel (10) which is delimited by a first (12) and a second (14) channel electrode, and having a gate electrode (16) which is associated with the channel and which cooperates with the channel in such a way that a change in conductivity of the channel (10) occurs as a response to an action of a gas. The gate electrode (16) and/or a gate insulation layer (20) which insulates the gate electrode from the channel, and/or a gate stack layer (18) which may be provided between the gate electrode and the channel have/has two surface sections (22, 24) which differ in their sensitivity to gases.
Public/Granted literature
- US20110121368A1 Gas-sensitive semiconductor device Public/Granted day:2011-05-26
Information query
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