发明授权
- 专利标题： Imprint lithography
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申请号： US12314246申请日： 2008-12-05
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公开(公告)号： US08524136B2公开(公告)日： 2013-09-03
- 发明人: Yvonne Wendela Kruijt-Stegeman , Ivar Schram , Sander Frederik Wuister , Jeroen Herman Lammers
- 申请人： Yvonne Wendela Kruijt-Stegeman , Ivar Schram , Sander Frederik Wuister , Jeroen Herman Lammers
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： B28B11/08
- IPC分类号： B28B11/08
摘要：
An imprint template cover for an imprint template having a pattern feature thereon. The cover is configured such that, in use, it extends around the pattern feature of the imprint template, and such that the cover does not contact the pattern feature.
公开/授权文献
- US20090146347A1 Imprint lithography 公开/授权日：2009-06-11
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