发明授权
- 专利标题： Laser irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device
- 专利标题（中）： 激光照射装置，激光照射方法以及半导体装置的制造方法
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申请号： US11639416申请日： 2006-12-15
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公开(公告)号： US08525070B2公开(公告)日： 2013-09-03
- 发明人: Koichiro Tanaka , Yoshiaki Yamamoto
- 申请人： Koichiro Tanaka , Yoshiaki Yamamoto
- 申请人地址： JP Kanagawa-ken
- 专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址： JP Kanagawa-ken
- 代理机构： Nixon Peabody LLP
- 代理商 Jeffrey L. Costellia
- 优先权： JP2005-366169 20051220
- 主分类号： B23K26/08
- IPC分类号： B23K26/08 ; H01L21/324
摘要：
A laser irradiation apparatus is provided with a laser oscillator, an articulated beam propagator in which a plurality of pipes are connected to each other in an articulated portion, and a course change means of a laser beam in the articulated portion. At least one pipe of the plurality of pipes includes a transfer lens for suppressing stagger of a laser beam in a traveling direction, in each pipe. The articulated portion produces degree of freedom in disposition of a laser oscillator, and the transfer lens enables suppression of change in beam profile.
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