发明授权
US08527255B2 Methods and systems for lithography process window simulation 有权
光刻工艺窗口模拟方法与系统

Methods and systems for lithography process window simulation
摘要:
A method of efficient simulating imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and generating the simulated image utilizing the function, where the simulated image represents the imaging result of the target design for the lithographic process.
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