Invention Grant
- Patent Title: Non-volatile memory device and method for fabricating the same
- Patent Title (中): 非易失性存储器件及其制造方法
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Application No.: US13277496Application Date: 2011-10-20
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Publication No.: US08530956B2Publication Date: 2013-09-10
- Inventor: Sang-Bum Lee
- Applicant: Sang-Bum Lee
- Applicant Address: KR Gyeonggi-do
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T Group LLP
- Priority: KR10-2010-0138837 20101230
- Main IPC: H01L29/792
- IPC: H01L29/792

Abstract:
A non-volatile memory device including a memory string including a plurality of memory cells coupled in series. The non-volatile memory device includes the memory string including a first semiconductor layer and a second conductive layer with a memory gate insulation layer therebetween, a first selection transistor comprising a second semiconductor layer coupled with one end of the first semiconductor layer, a second selection transistor comprising a third semiconductor layer coupled with the other end of the first semiconductor layer, and a fourth semiconductor layer contacting the first semiconductor layer in a region where the second conductive layer is not disposed.
Public/Granted literature
- US20120168824A1 NON-VOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2012-07-05
Information query
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