Invention Grant
US08533635B2 Rule-based root cause and alias analysis for semiconductor manufacturing
失效
基于规则的半导体制造的根本原因和别名分析
- Patent Title: Rule-based root cause and alias analysis for semiconductor manufacturing
- Patent Title (中): 基于规则的半导体制造的根本原因和别名分析
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Application No.: US12690492Application Date: 2010-01-20
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Publication No.: US08533635B2Publication Date: 2013-09-10
- Inventor: Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
- Applicant: Robert J. Baseman , Fateh A. Tipu , Sholom M. Weiss
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Daniel P. Morris, Esq.
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
The present invention includes a computing system determining a best alias rule in a semiconductor manufacturing process. The computing system obtains an original rule and candidate alias rules based on sampled data from the semiconductor manufacturing process. The computing system compares the original rule to the candidate alias rules. The computing system ranks the candidate alias rules according to the comparison. The computing system filters the ranked candidate alias rules. A user selects one rule among the filtered candidate alias rules based on knowledge of the semiconductor manufacturing process.
Public/Granted literature
- US20110178624A1 RULE-BASED ROOT CAUSE AND ALIAS ANALYSIS FOR SEMICONDUCTOR MANUFACTURING Public/Granted day:2011-07-21
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