Invention Grant
- Patent Title: Apparatus for adjusting planarity of workpiece
- Patent Title (中): 用于调整工件平面度的装置
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Application No.: US13284705Application Date: 2011-10-28
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Publication No.: US08533969B2Publication Date: 2013-09-17
- Inventor: Xin-Yan Wang
- Applicant: Xin-Yan Wang
- Applicant Address: CN Shenzhen HK Kowloon
- Assignee: Shenzhen Futaihong Precision Industry Co., Ltd.,FIH (Hong Kong) Limited
- Current Assignee: Shenzhen Futaihong Precision Industry Co., Ltd.,FIH (Hong Kong) Limited
- Current Assignee Address: CN Shenzhen HK Kowloon
- Agency: Altis Law Group, Inc.
- Priority: CN201110181658 20110630
- Main IPC: G01B5/25
- IPC: G01B5/25 ; G01B5/20

Abstract:
An apparatus includes a base, a cover and a rotating shaft. The base includes a platform formed on the base for placing a workpiece, a supporting post protruding from the platform, and a pair of opposite connecting seats protruding from an end of the base. Each connecting seat defines a pin hole. The cover includes a board portion defining a positioning hole corresponding to the supporting post, a hollow rotating portion defining a through hole, and a connecting portion interconnecting the board portion and the rotating portion. The rotating shaft extends through the rotating portion with two ends received in the pin holes, rotatably interconnecting the cover to the base. The radius of the through hole is larger than that of the rotating shaft. When the board portion presses on the workpiece, the supporting post lifts the board portion.
Public/Granted literature
- US20130000137A1 APPARATUS FOR ADJUSTING PLANARITY OF WORKPIECE Public/Granted day:2013-01-03
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