发明授权
- 专利标题： Patterning of magnetic thin film using energized ions
- 专利标题（中）： 使用带电离子形成磁性薄膜
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申请号： US12255833申请日： 2008-10-22
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公开(公告)号： US08535766B2公开(公告)日： 2013-09-17
- 发明人: Steven Verhaverbeke , Omkaram Nalamasu , Majeed Foad , Mahalingam Venkatesan , Nety M. Krishna
- 申请人： Steven Verhaverbeke , Omkaram Nalamasu , Majeed Foad , Mahalingam Venkatesan , Nety M. Krishna
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson & Sheridan, LLP
- 主分类号： B05D5/00
- IPC分类号： B05D5/00 ; B05D3/06 ; B05D3/04 ; C23C14/04 ; C23C14/16 ; C23C14/48 ; C23C14/58
摘要：
A method for patterning a magnetic thin film on a substrate includes: providing a pattern about the magnetic thin film, with selective regions of the pattern permitting penetration of energized ions of one or more elements. Energized ions are generated with sufficient energy to penetrate selective regions and a portion of the magnetic thin film adjacent the selective regions. The substrate is placed to receive the energized ions. The portions of the magnetic thin film are rendered to exhibit a magnetic property different than selective other portions. A method for patterning a magnetic media with a magnetic thin film on both sides of the media is also disclosed.
公开/授权文献
- US20100098873A1 PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS 公开/授权日：2010-04-22
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