Invention Grant
US08535792B2 Polyetherimide resins with very low levels of residual contamination
有权
具有非常低残留污染水平的聚醚酰亚胺树脂
- Patent Title: Polyetherimide resins with very low levels of residual contamination
- Patent Title (中): 具有非常低残留污染水平的聚醚酰亚胺树脂
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Application No.: US13174433Application Date: 2011-06-30
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Publication No.: US08535792B2Publication Date: 2013-09-17
- Inventor: Daniel Francis Lowery , Jamuna Chakravarti , Aaron Royer
- Applicant: Daniel Francis Lowery , Jamuna Chakravarti , Aaron Royer
- Applicant Address: NL Bergen op Zoom
- Assignee: Sabic Innovative Plastics IP B.V.
- Current Assignee: Sabic Innovative Plastics IP B.V.
- Current Assignee Address: NL Bergen op Zoom
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Agent Diderico van Eyl
- Main IPC: B32B3/02
- IPC: B32B3/02 ; C08L79/08 ; C08K7/14 ; G11B5/48

Abstract:
Compositions and methods for producing compositions comprising a monoamine-endcapped polyimide component. Based on a gas chromatography mass spectroscopy analysis of a surface rinse of the composition performed at room temperature, the composition can have at least one surface with less than or equal to 5 ppb releasable phosphorous residuals, and less than or equal to 5 ppb releasable volatile organic compound residuals. The composition can also comprise less than or equal to 10 ppb combined releasable residuals. Because of the very low levels of residual contamination, the compositions can be used to produce a variety of articles, including a disk drive.
Public/Granted literature
- US20130003227A1 POLYETHERIMIDE RESINS WITH VERY LOW LEVELS OF RESIDUAL CONTAMINATION Public/Granted day:2013-01-03
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