发明授权
- 专利标题: Phototherapy apparatus using excimer radiation
- 专利标题(中): 使用准分子辐射的光疗仪
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申请号: US11610130申请日: 2006-12-13
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公开(公告)号: US08540757B2公开(公告)日: 2013-09-24
- 发明人: Taku Sumitomo , Tatumi Hiramoto , Akimichi Morita
- 申请人: Taku Sumitomo , Tatumi Hiramoto , Akimichi Morita
- 申请人地址: JP Tokyo
- 专利权人: Ushiodenki Kabushiki Kaisha
- 当前专利权人: Ushiodenki Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Roberts Mlotkowski Safran & Cole, P.C.
- 代理商 David S. Safran
- 优先权: JP2005-359327 20051213
- 主分类号: A61N5/06
- IPC分类号: A61N5/06
摘要:
A phototherapy device using excimer radiation in which, by skillful use of the individual peak wavelength of 308 nm and of the emission range of shorter wavelengths than 308 nm, the therapy effect is enhanced, and in which, at the same time, harm can be reduced is achieved using a XeCl excimer lamp and in which diseased sites of skin disorders are irradiated with UV-B radiation with an optical filter being used for changing the spectral shape of the UV-B radiation with which the diseased sites are irradiated.
公开/授权文献
- US20070135872A1 PHOTOTHERAPY APPARATUS USING EXCIMER RADIATION 公开/授权日:2007-06-14
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