Invention Grant
US08545292B2 Two-component urethane resin composition for polishing pad, polyurethane polishing pad, and method for producing polyurethane polishing pad
失效
用于抛光垫的双组分聚氨酯树脂组合物，聚氨酯抛光垫，以及聚氨酯抛光垫的制造方法
- Patent Title: Two-component urethane resin composition for polishing pad, polyurethane polishing pad, and method for producing polyurethane polishing pad
- Patent Title (中): 用于抛光垫的双组分聚氨酯树脂组合物，聚氨酯抛光垫，以及聚氨酯抛光垫的制造方法
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Application No.: US13379799Application Date: 2010-05-19
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Publication No.: US08545292B2Publication Date: 2013-10-01
- Inventor: Tomoaki Shinchi , Hiroshi Suzaki
- Applicant: Tomoaki Shinchi , Hiroshi Suzaki
- Applicant Address: JP Tokyo
- Assignee: DIC Corporation
- Current Assignee: DIC Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2009-153603 20090629
- International Application: PCT/JP2010/058410 WO 20100519
- International Announcement: WO2011/001755 WO 20110106
- Main IPC: B24D3/20
- IPC: B24D3/20
Abstract:
The present invention relates to a two-component urethane resin composition for a polishing pad including a base resin containing an isocyanate group-terminated urethane prepolymer (A) and a curing agent containing an isocyanate group reactive compound (B), and characterized in that the prepolymer (A) is a prepolymer having an isocyanate group equivalent of 250 to 700 and being produced by reacting a polyisocyanate (a1) with an aromatic polyester polyol (a2) and a polyether polyol (a3) which are used as polyol components in combination at a mass ratio of (a2)/(a3)=5/95 to 70/30, and the aromatic polyester polyol (a2) has 2 to 11 aromatic rings in its molecular chain, and also relates to a polyurethane polishing pad using the resin composition and a method for producing a polyurethane polishing pad.
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