Invention Grant
- Patent Title: III nitride crystal substrate, and light-emitting device and method of its manufacture
- Patent Title (中): III族氮化物晶体基板,以及其制造方法
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Application No.: US12324897Application Date: 2008-11-28
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Publication No.: US08546166B2Publication Date: 2013-10-01
- Inventor: Shinsuke Fujiwara , Hiroaki Yoshida
- Applicant: Shinsuke Fujiwara , Hiroaki Yoshida
- Applicant Address: JP Osaka
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka
- Agent James W. Judge
- Priority: JP2007-310725 20071130
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Toward making available III nitride crystal substrates advantageously employed in light-emitting devices, and light-emitting devices incorporating the substrates and methods of manufacturing the light-emitting devices, a III nitride crystal substrate has a major face whose surface area is not less than 10 cm2 and, in a major-face principal region excluding the peripheral margin of the major face from its outer periphery to a 5 mm separation from its outer periphery, the total dislocation density is from 1×104 cm−2 to 3×106 cm−2, and the ratio of screw-dislocation density to the total dislocation density is 0.5 or greater.
Public/Granted literature
- US20090140287A1 III Nitride Crystal Substrate, and Light-Emitting Device and Method of Its Manufacture Public/Granted day:2009-06-04
Information query
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