发明授权
- 专利标题： Methods of producing hydrochloric acid from hydrogen gas and chlorine gas
- 专利标题（中）： 从氢气和氯气生产盐酸的方法
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申请号： US12790613申请日： 2010-05-28
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公开(公告)号： US08551299B2公开(公告)日： 2013-10-08
- 发明人: Majid Keshavarz , Saroj Kumar Sahu , Chockkalingam Karuppaiah , Ge Zu , Suresh Kumar Surapalan Nair , Vasanthan Mani
- 申请人： Majid Keshavarz , Saroj Kumar Sahu , Chockkalingam Karuppaiah , Ge Zu , Suresh Kumar Surapalan Nair , Vasanthan Mani
- 申请人地址： US CA Fremont
- 专利权人： Deeya Energy, Inc.
- 当前专利权人： Deeya Energy, Inc.
- 当前专利权人地址： US CA Fremont
- 代理机构： Haynes and Boone LLP
- 主分类号： C01B7/01
- IPC分类号： C01B7/01 ; H01M6/50 ; H01M6/04
摘要：
A method of producing HCl from H2 and Cl2 is provided. In some embodiments, the method comprises at least one photochemical chamber placed in fluid communication with at least one source of H2 and at least one source of Cl2. In some embodiments, the photochemical chamber effects the formation of HCl through the use of at least one source of ultraviolet radiation contained therein. In some embodiments, the HCl product may be captured and used as a gas. In some embodiments, the HCl product may be absorbed into water to form an aqueous HCl solution.
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