发明授权
- 专利标题: Heat-radiating substrate and method of manufacturing the same
- 专利标题(中): 散热基板及其制造方法
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申请号: US13007545申请日: 2011-01-14
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公开(公告)号: US08553417B2公开(公告)日: 2013-10-08
- 发明人: Ji Hyun Park , Seog Moon Choi , Young Ki Lee
- 申请人: Ji Hyun Park , Seog Moon Choi , Young Ki Lee
- 申请人地址: KR Suwon, Gyunggi-Do
- 专利权人: Samsung Electro-Mechanics Co., Ltd.
- 当前专利权人: Samsung Electro-Mechanics Co., Ltd.
- 当前专利权人地址: KR Suwon, Gyunggi-Do
- 代理机构: Blakely Sokoloff Taylor & Zafman LLP
- 优先权: KR10-2010-0116981 20101123
- 主分类号: H05K7/20
- IPC分类号: H05K7/20
摘要:
Disclosed herein are a heat-radiating substrate and a method of manufacturing the same. The heat-radiating substrate includes: a base substrate with a heat sink, having a groove; an insulating layer formed on the base substrate by performing anodization thereon; and a circuit layer formed on the insulating layer, whereby the heat-radiating substrate with the heat-sink, made of metal material, is manufactured, thereby making it possible to protect devices weak against heat and thus solve the problem in view of reduced life span and degraded reliability.
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