发明授权
- 专利标题: Memory cell that includes a carbon-based memory element and methods of forming the same
- 专利标题(中): 包含碳基记忆元件的记忆单元及其形成方法
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申请号: US12536463申请日: 2009-08-05
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公开(公告)号: US08557685B2公开(公告)日: 2013-10-15
- 发明人: Huiwen Xu
- 申请人: Huiwen Xu
- 申请人地址: US CA Milpitas
- 专利权人: SanDisk 3D LLC
- 当前专利权人: SanDisk 3D LLC
- 当前专利权人地址: US CA Milpitas
- 代理机构: Dugan & Dugan, PC
- 主分类号: H01L21/20
- IPC分类号: H01L21/20 ; H01L47/00
摘要:
Memory cells, and methods of forming such memory cells, are provided that include a carbon-based reversible resistivity switching material. In particular embodiments, methods in accordance with this invention form a memory cell by (a) depositing a layer of the carbon material above a substrate; (b) doping the deposited carbon layer with a dopant; (c) depositing a layer of the carbon material over the doped carbon layer; and (d) iteratively repeating steps (b) and (c) to form a stack of doped carbon layers having a desired thickness. Other aspects are also provided.