Invention Grant
US08558191B2 Charged particle beam lens and charged particle beam exposure apparatus
失效
带电粒子束透镜和带电粒子束曝光装置
- Patent Title: Charged particle beam lens and charged particle beam exposure apparatus
- Patent Title (中): 带电粒子束透镜和带电粒子束曝光装置
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Application No.: US13744536Application Date: 2013-01-18
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Publication No.: US08558191B2Publication Date: 2013-10-15
- Inventor: Akira Shimazu
- Applicant: Canon Kabushiki Kaisha
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2012-029107 20120214
- Main IPC: G21K1/08
- IPC: G21K1/08

Abstract:
A charged particle beam lens includes a first electrode on a downstream side and a second electrode on an upstream side in a travelling direction of a charged particle beam. Each of the first electrode and the second electrode has a first through hole formed therein, through which the charged particle beam passes. The second electrode further has a second through hole formed therein, through which the charged particle beam does not pass. A distance defining member is provided between the first electrode and the second electrode such that the first electrode and the second electrode are spaced away from each other. A gap is surrounded the first electrode, the second electrode, and the distance defining member, wherein both the first through and the second through hole communicate to the gap. A third through hole passes through the first electrode and the second electrode in the travelling direction of the charged particle beam, and the third through hole is provided outside of the gap and does not communicate to the gap.
Public/Granted literature
- US20130206999A1 CHARGED PARTICLE BEAM LENS AND CHARGED PARTICLE BEAM EXPOSURE APPARATUS Public/Granted day:2013-08-15
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