Invention Grant
- Patent Title: Thin film transistor substrate and manufacturing method for the same
- Patent Title (中): 薄膜晶体管基板及其制造方法相同
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Application No.: US13480980Application Date: 2012-05-25
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Publication No.: US08558226B2Publication Date: 2013-10-15
- Inventor: Toshihiko Iwasaka , Kazunori Inoue , Masaru Aoki , Reiko Noguchi
- Applicant: Toshihiko Iwasaka , Kazunori Inoue , Masaru Aoki , Reiko Noguchi
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-123612 20110601
- Main IPC: H01L33/08
- IPC: H01L33/08

Abstract:
Provided is a thin film transistor having a semiconductor film disposed in a plurality of portions on a substrate, a source electrode and a drain electrode which are disposed, on a semiconductor film, in contact with the semiconductor film while being spaced from each other, and a gate electrode which is disposed across the source electrode and the drain electrode via a gate insulating film; an auxiliary capacitance electrode which is disposed on the semiconductor film while in contact with the semiconductor film; a source line which has the semiconductor film in a lower layer, extends from the source electrode; a gate line which extends from the gate electrode; a pixel electrode which is electrically connected to the drain electrode; and an auxiliary capacitance electrode connecting line which electrically connects the auxiliary capacitance electrodes to each other in the adjacent pixels.
Public/Granted literature
- US20120305911A1 THIN FILM TRANSISTOR SUBSTRATE AND MANUFACTURING METHOD FOR THE SAME Public/Granted day:2012-12-06
Information query
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