发明授权
- 专利标题: Micropattern transfer method and micropattern transfer device
- 专利标题(中): 微图案转印方式和微图案转印装置
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申请号: US12765145申请日: 2010-04-22
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公开(公告)号: US08562896B2公开(公告)日: 2013-10-22
- 发明人: Satoshi Ishii , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
- 申请人: Satoshi Ishii , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2009-105882 20090424
- 主分类号: B82Y40/00
- IPC分类号: B82Y40/00
摘要:
An object of the present invention is to provide a micropattern transfer method and a micropattern transfer device in which the small amount of resin is applied to a substrate, and the nonuniformity in thickness is prevented to arise on the obtained pattern forming layer. In order to achieve the above object, the present invention provides a micropattern transfer method in which a micropattern is transferred to a resin by pressing a stamper having the micropattern onto the resin applied to a substrate, including the steps of: applying the resin to a surface of the substrate discretely in order to obtain a plurality of resin islands so that a center portion of each of the resin islands forms a planar thin-film, and a peripheral portion of the resin island rises higher than the center portion.