Invention Grant
- Patent Title: Nano pattern formation
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Application No.: US12507718Application Date: 2009-07-22
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Publication No.: US08563086B2Publication Date: 2013-10-22
- Inventor: Kwangyeol Lee
- Applicant: Kwangyeol Lee
- Applicant Address: KR Seoul
- Assignee: Korea Institute Research and Business Foundation
- Current Assignee: Korea Institute Research and Business Foundation
- Current Assignee Address: KR Seoul
- Agency: Workman Nydegger
- Main IPC: B05D1/32
- IPC: B05D1/32 ; B05D5/00 ; B05D3/00 ; B32B3/00 ; B05D1/36
Abstract:
Nano structure patterning formation includes coating a part of a structural guide with a hydrophobic polymer, positioning the structural guide on a substrate, coating at least a part of the substrate with a film made of a block copolymer, and annealing the film made of the block copolymer to align the block copolymer.
Public/Granted literature
- US20110020608A1 NANO PATTERN FORMATION Public/Granted day:2011-01-27
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