发明授权
- 专利标题： System for and method for closed loop electrophoretic deposition of phosphor materials on semiconductor devices
- 专利标题（中）： 半导体器件上荧光材料闭环电泳沉积的系统和方法
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申请号： US11473089申请日： 2006-06-21
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公开(公告)号： US08563339B2公开(公告)日： 2013-10-22
- 发明人: Eric J. Tarsa , Michael Leung , Bernd Keller , Robert Underwood , Mark Youmans
- 申请人： Eric J. Tarsa , Michael Leung , Bernd Keller , Robert Underwood , Mark Youmans
- 申请人地址： US CA Goleta
- 专利权人： Cree, Inc.
- 当前专利权人： Cree, Inc.
- 当前专利权人地址： US CA Goleta
- 代理机构： Koppel, Patrick, Heybl & Philpott
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; H01L21/326 ; H01L21/479 ; H01L21/20 ; H01L21/36 ; H01L21/31 ; H01L21/469
摘要：
One close loop system and method for electrophoretic deposition (EPD) of phosphor material on light emitting diodes (LEDs). The system comprises a deposition chamber sealed from ambient air. A mixture of phosphor material and solution is provided to the chamber with the mixture also being sealed from ambient air. A carrier holds a batch of LEDs in the chamber with the mixture contacting the areas of the LEDs for phosphor deposition. A voltage supply applies a voltage to the LEDs and the mixture to cause the phosphor material to deposit on the LEDs at the mixture contacting areas.
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