Invention Grant
- Patent Title: Distortion free stigmation of a TEM
- Patent Title (中): TEM的失真自由度
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Application No.: US13446908Application Date: 2012-04-13
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Publication No.: US08569693B2Publication Date: 2013-10-29
- Inventor: Maarten Bischoff , Alexander Henstra , Uwe Luecken , Peter Christiaan Tiemeijer
- Applicant: Maarten Bischoff , Alexander Henstra , Uwe Luecken , Peter Christiaan Tiemeijer
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, PC
- Agent Michael O. Scheinberg
- Priority: EP11162275 20110413
- Main IPC: G21K7/00
- IPC: G21K7/00

Abstract:
A charged particle apparatus is equipped with a third stigmator positioned between the objective lens and a detector system, as a result of which a third degree of freedom is created for reducing the linear distortion. Further, a method of using said three stigmators, comprises exciting the first stigmator to reduce astigmatism when imaging the sample, exciting the second stigmator to reduce astigmatism when imaging the diffraction plane, and exciting the third stigmator to reduce the linear distortion.
Public/Granted literature
- US20130062520A1 Distortion Free Stigmation of a TEM Public/Granted day:2013-03-14
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