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US08569801B2 Three-dimensional CMOS circuit on two offset substrates and method for making same 有权
两个偏移基板上的三维CMOS电路及其制造方法

Three-dimensional CMOS circuit on two offset substrates and method for making same
Abstract:
A three-dimensional CMOS circuit having at least a first N-conductivity field-effect transistor and a second P-conductivity field-effect transistor respectively formed on first and second crystalline substrates. The first field-effect transistor is oriented, in the first substrate, with a first secondary crystallographic orientation. The second field-effect transistor is oriented, in the second substrate, with a second secondary crystallographic orientation. The orientations of the first and second transistors form a different angle from the angle formed, in one of the substrates, by the first and second secondary crystallographic directions. The first and second substrates are assembled vertically.
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