发明授权
- 专利标题: Scalable integrated circuit high density capacitors
- 专利标题(中): 可扩展集成电路高密度电容器
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申请号: US13162257申请日: 2011-06-16
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公开(公告)号: US08570707B2公开(公告)日: 2013-10-29
- 发明人: Victor Chiu-Kit Fong , Eric Bruce Blecker , Tom W. Kwan , Ning Li , Sumant Rangnathan , Chao Tang , Pieter Vorenkamp
- 申请人: Victor Chiu-Kit Fong , Eric Bruce Blecker , Tom W. Kwan , Ning Li , Sumant Rangnathan , Chao Tang , Pieter Vorenkamp
- 申请人地址: US CA Irvine
- 专利权人: Broadcom Corporation
- 当前专利权人: Broadcom Corporation
- 当前专利权人地址: US CA Irvine
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号: H01G4/228
- IPC分类号: H01G4/228
摘要:
The present invention provides several scalable integrated circuit high density capacitors and their layout techniques. The capacitors are scaled, for example, by varying the number of metal layers and/or the area of the metal layers used to from the capacitors. The capacitors use different metallization patterns to form the metal layers, and different via patterns to couple adjacent metal layers. In embodiments, optional shields are included as the top-most and/or bottom-most layers of the capacitors, and/or as side shields, to reduce unwanted parasitic capacitance.
公开/授权文献
- US20120018843A1 Scalable Integrated Circuit High Density Capacitors 公开/授权日:2012-01-26
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