Invention Grant
- Patent Title: Reactor and plant for the continuous preparation of high-purity silicon tetrachloride or high-purity germanium tetrachloride
- Patent Title (中): 反应器和设备用于连续制备高纯四氯化硅或高纯四氯化锗
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Application No.: US13447703Application Date: 2012-04-16
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Publication No.: US08574505B2Publication Date: 2013-11-05
- Inventor: Juergen Erwin Lang , Rainer Nicolai , Hartwig Rauleder
- Applicant: Juergen Erwin Lang , Rainer Nicolai , Hartwig Rauleder
- Applicant Address: DE Essen
- Assignee: Evonik Degussa GmbH
- Current Assignee: Evonik Degussa GmbH
- Current Assignee Address: DE Essen
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: DE102005041137 20050830
- Main IPC: B01J19/08
- IPC: B01J19/08

Abstract:
A reactor and a plant containing the reactor for conducting a continuous, industrial process for preparing high-purity silicon tetrachloride or high-purity germanium tetrachloride is provided. The plant contains a plasma reactor having a dielectric, a high voltage electrode and an earthed, metallic heat exchanger, in which the longitudinal axes of the dielectric, of the high-voltage electrode and of the earthed, metallic heat exchanger are oriented parallel to one another and at the same time parallel to the force vector of gravity.
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