Invention Grant
- Patent Title: Ion source apparatus and methods of using the same
- Patent Title (中): 离子源装置及其使用方法
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Application No.: US13269795Application Date: 2011-10-10
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Publication No.: US08575565B2Publication Date: 2013-11-05
- Inventor: Maximo Frati
- Applicant: Maximo Frati
- Applicant Address: US MI Auburn Hills
- Assignee: Guardian Industries Corp.
- Current Assignee: Guardian Industries Corp.
- Current Assignee Address: US MI Auburn Hills
- Agency: Nixon & Vanderhye P.C.
- Main IPC: H01J1/50
- IPC: H01J1/50 ; G21K5/04

Abstract:
An ion beam source that emits an ion beam in a direction of a substrate is provided. A cathode with a discharge opening defined therein is included. An anode is also included and spaced apart from the cathode. Ions are set to be emitted in an area proximate to the discharge opening in a direction similar to the direction from the anode to the discharge opening. First and second ceramic walls at least partially define a discharge channel between the anode and the cathode. At least one magnet generates a magnetic field in an area proximate to the discharge opening.
Public/Granted literature
- US20130088150A1 ION SOURCE APPARATUS AND METHODS OF USING THE SAME Public/Granted day:2013-04-11
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