发明授权
- 专利标题: Method for treating surface of glass substrate and apparatus for performing same
- 专利标题(中): 玻璃基板表面处理方法及其制造方法
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申请号: US12832738申请日: 2010-07-08
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公开(公告)号: US08580353B2公开(公告)日: 2013-11-12
- 发明人: Chien-Min Weng , Shih-Liang Chou , Tzu-Wen Chu , Fu-Jen Wang
- 申请人: Chien-Min Weng , Shih-Liang Chou , Tzu-Wen Chu , Fu-Jen Wang
- 申请人地址: TW Yang-Mei Jen, Tao-Yuan
- 专利权人: Applied Vacuum Coating Technologies Co., Ltd.
- 当前专利权人: Applied Vacuum Coating Technologies Co., Ltd.
- 当前专利权人地址: TW Yang-Mei Jen, Tao-Yuan
- 代理机构: Jackson IPG PLLC
- 主分类号: H05H1/00
- IPC分类号: H05H1/00 ; C23C14/02
摘要:
A method for treating a surface of a glass substrate according to the invention has the steps of placing the glass substrate into a vacuum treatment chamber, introducing a gas into the vacuum treatment chamber, providing electric power to generate an ion source and using the ion source to treat the surface of the glass substrate. By this way, the invention can achieve an effect of surface cleaning and further render the conductive film to be coated on the glass substrate in the subsequent stage to have a reduced surface resistance, thereby improving the conductivity of the glass substrate. The film coated on the glass substrate in the subsequent stage will have higher crystalline level as well.
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