Invention Grant
- Patent Title: Method for treating surface of glass substrate and apparatus for performing same
- Patent Title (中): 玻璃基板表面处理方法及其制造方法
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Application No.: US12832738Application Date: 2010-07-08
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Publication No.: US08580353B2Publication Date: 2013-11-12
- Inventor: Chien-Min Weng , Shih-Liang Chou , Tzu-Wen Chu , Fu-Jen Wang
- Applicant: Chien-Min Weng , Shih-Liang Chou , Tzu-Wen Chu , Fu-Jen Wang
- Applicant Address: TW Yang-Mei Jen, Tao-Yuan
- Assignee: Applied Vacuum Coating Technologies Co., Ltd.
- Current Assignee: Applied Vacuum Coating Technologies Co., Ltd.
- Current Assignee Address: TW Yang-Mei Jen, Tao-Yuan
- Agency: Jackson IPG PLLC
- Main IPC: H05H1/00
- IPC: H05H1/00 ; C23C14/02

Abstract:
A method for treating a surface of a glass substrate according to the invention has the steps of placing the glass substrate into a vacuum treatment chamber, introducing a gas into the vacuum treatment chamber, providing electric power to generate an ion source and using the ion source to treat the surface of the glass substrate. By this way, the invention can achieve an effect of surface cleaning and further render the conductive film to be coated on the glass substrate in the subsequent stage to have a reduced surface resistance, thereby improving the conductivity of the glass substrate. The film coated on the glass substrate in the subsequent stage will have higher crystalline level as well.
Public/Granted literature
- US20120009354A1 Method for treating surface of glass substrate and apparatus for performing same Public/Granted day:2012-01-12
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