Invention Grant
US08585633B2 Gas mist pressure bath system 有权
气雾压浴系统

  • Patent Title: Gas mist pressure bath system
  • Patent Title (中): 气雾压浴系统
  • Application No.: US12998581
    Application Date: 2010-02-16
  • Publication No.: US08585633B2
    Publication Date: 2013-11-19
  • Inventor: Shoichi Nakamura
  • Applicant: Shoichi Nakamura
  • Applicant Address: JP Higashichikuma-Gun, Nagano
  • Assignee: ACP Japan
  • Current Assignee: ACP Japan
  • Current Assignee Address: JP Higashichikuma-Gun, Nagano
  • Agent Manabu Kanesaka
  • Priority: JP2009-037109 20090219; JP2009-037110 20090219
  • International Application: PCT/JP2010/052239 WO 20100216
  • International Announcement: WO2010/095607 WO 20100826
  • Main IPC: A61M37/00
  • IPC: A61M37/00
Gas mist pressure bath system
Abstract:
The invention to provide a gas mist pressure bath system which is possible to control the amounts, pressures and others of gas and liquid, and cause the gas mist to be absorbed through the skin and mucous membrane of a human living organism under an optimum condition. This system is for preparing a mist (gas mist) by pulverizing and dissolving a gas (carbon dioxide or oxygen, otherwise a mixed gas) and a liquid at a density of not less than a predetermined value, and contacting the mist to the skin and mucous membrane of a living organism. The system comprises a first gas supply means 11 for generating the gas mist, a second gas supply means 12 for dissolving the gas in the liquid, a liquid supply means 21, a gas mist supply means 31 for pressure-supplying the gas mist, and a covering member 41 for covering the skin and mucous membrane and forming a space for sealing inside the gas mist supplied from the gas mist supply means 31, contacting the gas mist within the living organism covering member 41 to the skin and mucous membrane at pressure of not less than a predetermined value.
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