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US08585916B2 Micropores and methods of making and using thereof 有权
微孔及其制造和使用方法

Micropores and methods of making and using thereof
Abstract:
Disclosed herein are methods of making micropores of a desired height and/or width between two isotropic wet etched features in a substrate which comprises single-level isotropic wet etching the two features using an etchant and a mask distance that is less than 2× a set etch depth. Also disclosed herein are methods using the micropores and microfluidic devices comprising the micropores.
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