Invention Grant
- Patent Title: Conductive lines and pads and method of manufacturing thereof
-
Application No.: US12836151Application Date: 2010-07-14
-
Publication No.: US08586472B2Publication Date: 2013-11-19
- Inventor: Roland Hampp , Thomas Fischer , Uwe Hoeckele
- Applicant: Roland Hampp , Thomas Fischer , Uwe Hoeckele
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
A semiconductor device and method are disclosed. The semiconductor device includes a substrate having a first region and a second region and an insulating layer arranged on the substrate. A first conductive layer is arranged in or on insulating layer in the first region and a second conductive layer is arranged in or on the insulating layer in the second region. The first conductive layer comprises a first conductive material and the second conductive layer comprises a second conductive material wherein the first conductive material is different than the second conductive material. A metal layer is arranged on the first conductive layer.
Public/Granted literature
- US20120013011A1 Conductive Lines and Pads and Method of Manufacturing Thereof Public/Granted day:2012-01-19
Information query
IPC分类: