发明授权
- 专利标题: Method of adjustment on manufacturing of a circuit having a resonant element
- 专利标题(中): 具有谐振元件的电路的制造调整方法
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申请号: US12896093申请日: 2010-10-01
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公开(公告)号: US08587921B2公开(公告)日: 2013-11-19
- 发明人: Pierre Bar , Sylvain Joblot , David Petit
- 申请人: Pierre Bar , Sylvain Joblot , David Petit
- 申请人地址: FR Montrouge
- 专利权人: STMicroelectronics SA
- 当前专利权人: STMicroelectronics SA
- 当前专利权人地址: FR Montrouge
- 代理机构: Seed IP Law Group PLLC
- 优先权: FR0956860 20091001
- 主分类号: H01G4/005
- IPC分类号: H01G4/005 ; H01G4/06
摘要:
A method of adjustment in the manufacture of a capacitance of a capacitor supported by a substrate, the method including the steps of: a) forming a first electrode parallel to the surface of the substrate and covering it with a dielectric layer; b) forming, on a first portion of the dielectric layer, a second electrode; c) measuring the capacitance between the first electrode and the second electrode, and deducing therefrom the capacitance to be added to obtain the desired capacitance; d) thinning down a second portion of the dielectric layer, which is not covered by the second electrode, so that the thickness of this second portion is adapted to the forming of the deduced capacitance; and e) forming a third electrode on the thinned-down portion and connecting it to the second electrode.
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