发明授权
- 专利标题： Top coat composition
- 专利标题（中）： 上衣组合
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申请号： US13139641申请日： 2009-12-11
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公开(公告)号： US08592508B2公开(公告)日： 2013-11-26
- 发明人: Haruhiko Komoriya , Shinichi Sumida , Kenjin Inomiya , Takashi Mori , Takamasa Kitamoto , Yusuke Kanto
- 申请人： Haruhiko Komoriya , Shinichi Sumida , Kenjin Inomiya , Takashi Mori , Takamasa Kitamoto , Yusuke Kanto
- 申请人地址： JP Ube-shi
- 专利权人： Central Glass Company, Limited
- 当前专利权人： Central Glass Company, Limited
- 当前专利权人地址： JP Ube-shi
- 代理机构： Crowell & Moring LLP
- 优先权： JP2008-319028 20081215
- 国际申请： PCT/JP2009/070725 WO 20091211
- 国际公布： WO2010/071081 WO 20100624
- 主分类号： C09D133/16
- IPC分类号： C09D133/16
摘要：
Disclosed is a top coat composition for photoresist, which is characterized by containing a fluorinated polymer having a repeating unit represented by general formula (5). In the formula, R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; n represents 0 or 1; m represents an integer of 1 to (3+n); and R2 or R3 represents a hydrogen atom or a protecting group. The top coat composition has a proper degree of solubility in a developing solution.
公开/授权文献
- US20110245395A1 Top Coat Composition 公开/授权日：2011-10-06